# Электронная книга: Arce Gonzalo R. «Computational Lithography»

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography,and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. Издательство: "John Wiley&Sons Limited"
ISBN: 9780470618936 электронная книга Купить за 9521.78 руб и скачать на Litres |

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**Computational lithography**— (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as … Wikipedia**Computational**— may refer to: Computer Computational algebra Computational Aeroacoustics Computational and Information Systems Laboratory Computational and Systems Neuroscience Computational archaeology Computational auditory scene analysis Computational biology … Wikipedia**Next-generation lithography**— (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia**Photolithography**— For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia**Optical proximity correction**— An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to … Wikipedia**Mask shop**— A mask shop is a factory which manufactures photomasks for use in the semiconductor industry. There are two distinct types found in the trade. Captive mask shops are in house operations owned by the biggest semiconductor corporations, while… … Wikipedia**Photonic metamaterial**— Electromagnetism Electricity · … Wikipedia**Superlens**— A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia**Double patterning**— is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia**Nanotechnology**— Part of a series of articles on … Wikipedia**Moore's law**— Plot of CPU transistor counts against dates of introduction. Note the logarithmic vertical scale; the line corresponds to exponential growth with transistor count doubling every two years … Wikipedia